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Mask Synthesis and Data Prep

CATS

Technology Leading Mask Data Prep

CATS® is a highly scalable and flexible software application that transcribes complex design data into machine readable instructions for e-beam and laser machines used for the pattern generation and manufacturing of IC, MEMS, TFT-LCD, TFH, photonics, and biochip products. CATS has installations in virtually every photomask manufacturing facility worldwide, and is the de facto standard for mask manufacturing, inspection, metrology, and direct-write-on-wafer.
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CATS the MDP Standard

Standard MDP Applications

Mask Data Preparation
Technology Leading Mask Data Prep

	Basic and Advanced Fracture	CATS fracturing addresses challenges associated with different mask writers and inspections tools.

	Proximity Effect Correction	CATS provides correction of E-beam and Optical Proximity Effects

	Jobdeck Operations	Powerful and highly interactive mask and pattern support

	Manufacturing Rule Check	CATS is the only available software package to support e-beam and laser exposure tools, as well as all major inspection tools.

	Lithography Output Options	Comprehensive data prep solutions for mask and direct write

	Metrology Marking	Using jobdeck information and electron beam pattern file data, CATS Metrology Marking option provides a unique graphical and command-driven environment.

	Inspection Data Prep	CATS is the only commercially available software package to support both a wide variety of electron beam exposure tools and all major photomask inspection tools.

	Distributed Processing	CATS delivers highly scalable and cost-effective MDP